Custom Made 20T/H Industrial Ultra Pure Water Equipment For Lithography
| Product Type: | Other |
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| Keyword: | ultrapure water system ,ultrapure water machine | |
| Uses: | ||
| Origin: | ||
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If you are interested, please contact us!
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| MOQ: | 1sets | |
| FOB price: | US$44000~US$44500 | |
| Port: | 深圳盐田港 | |
| Payment Terms: | T/T | |
| Production Capacity: | >300套/月 | |
| Packing: | 出口标准木箱 | |
| Delivery Time: | 1-7个工作日（需支付原材料备货时间） | |
Product Description
I.Overview
Ultra-pure water plays an indispensable and critically important role in the lithography process. Lithography is one of the most core steps in semiconductor manufacturing, and lithography-grade ultra-pure water serves as the foundational guarantee for the continued evolution of “Moore's Law,” with requirements for cleanliness and chemical purity reach to an almost stringent extent. Ultra-pure water (UPW), with its extremely low impurity content, is the ideal medium to meet these stringent requirements. Its ultimate purity is the fundamental guarantee for ensuring precise, defect-free lithography patterns and high yield rates.
II.Process
Raw water → Multi-stage filtration → Reverse osmosis (RO) → Electrodeionization (EDI) → UV-ozone synergistic oxidation → Membrane degassing → Dual-stage mixed-bed polishing → Terminal filtration → Nitrogen-sealed water tank
III.Parameters
| Parameter | Required Value |
| Resistivity | ≥18.18 MΩ·cm (25°C) |
| Total Organic Carbon (TOC) | <0.5 ppb (Immersion fluid requirement <1 ppt) |
| 颗粒物 | >0.05μm 颗粒 <1 个/mL |
| 溶解氧 （DO） | <5 ppb |
| 细菌含量 | <0.01 CFU/毫升 |
| 二氧化硅 （SiO₂） | <1 ppb |
| 硼/钠离子 | <10 ppt |
四、应用场景
：晶圆清洗、
显影后清洗、
光刻胶/化学品
的稀释制备设备及元器件清洗
五、这是您获得正确报价
的指南告诉我们原水/水源（自来水、井水或海水等）
提供水分析报告（TDS、电导率或电阻率等）
所需生产能力（5m³/H、50m³/H或500m³/H等）
纯水的用途（工业、食品和饮料、或农业等）